Abstract
A novel method to fabricate a micro-scaled meter metallic stamp for imprinting is proposed in this study. Phase transformation film of amorphous Ge2Sb2Te5 (GST) was first deposited on cleaned silicon substrates by using DC sputtering process. The GST film is then irradiated with the femtosecond laser pulse directly through the photomask to photomelt and induces 2D-crystalline marks formed on the original amorphous region. Owing to the varied chemical properties between the amorphous region and crystalline marks, the crystalline marks were etched by using nitric acid mixed with ethanol. It is with this method that a micro-scaled meter metallic stamp was fabricated. Furthermore, the SU-8 polymeric patterns were successfully replicated and easily demolded from the etched GST stamp by using imprinting. Ultimately, with imprinting, the etched GST stamp could successfully replicate and also easily demold the SU-8 polymeric patterns.
Highlights
Imprinting technology is one of the most promising technological inventions characterized by low-cost, high fidelity, excellent repeatability and mass-production of micro or nanoscaled meter patterns over large areas while employing a single lithographic step [1,2,3,4,5,6]
The GST film was produced by phase transformation that was conducted with the method of photomelting
The purpose of this study is to propose a new method of fabrication employing metallic stamps for imprinting micro scaled meter pattern
Summary
Imprinting technology is one of the most promising technological inventions characterized by low-cost, high fidelity, excellent repeatability and mass-production of micro or nanoscaled meter patterns over large areas while employing a single lithographic step [1,2,3,4,5,6]. The key to successful imprinting technology is the use of the patterns in micro or nanoscaled meters, the replication of high resolution in large areas and the avoidance of adhering the polymer to the stamp. The direct electron beam lithography (EBL) combined with conventional dry ion etching and metal lift-off process is a powerful tool in imprinting lithography metallic stamp production [7]. The solution is made possible by using phase transformation films, femtosecond laser irradiation and etching process
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