Abstract
Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-Ray Exposure Technology †Electrochemical and Solid-State Letters, 6, G69 „2003...‡ T. C. Chang, T. M. Tsai, P. T. Liu, Y. S. Mor, C. W. Chen, J. T. Sheu, and T. Y. Tseng Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan Institute of Electronics, National Chiao Tung University, Hsin-Chu, Taiwan National Nano Device Laboratory, Hsin-Chu 300, Taiwan Department of Electrical Engineering, National Chi Nan University, Puli-Nantou, Taiwan 545
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