Abstract
The structure of thermal oxide films on copper has been investigated by optical microscopy, SEM and TEM of the stripped films and ultramicrotomed sections. High resolution transmission electron microscopy of the ultramicrotomed sections of the oxide film and the attached metal substrate revealed the mosaic structure of the oxide clearly at atomic-scale resolution for the first time. Thus, the correlation between the oxidation rate anisotropy and the anisotropy of the extent of paths for easy diffusion in the oxide has been confirmed. Further, examination of the oxide by XPS and EPMA has also shown the presence of CuO near the surface regions of the oxide, along with Cus O constituting the bulk of the oxide even for the oxidation times shorter than about 10 min at 178 °C.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
