Abstract
Thin film technology, based on different chemical and physical methods, enabled miniaturization, co-integration, and amelioration of the performance of the devices. Chemical vapor deposition (CVD) systems ensure high productivity and demonstrate excellent film uniformity (up to 12 inch wafers) and repeatability with high throughput for a variety of different films of oxides, nitrides, metals, chalcogenides, etc. In the last two decades, direct liquid injection (DLI)-CVD enabling the usage of solid and liquid precursors has proven to be one of the most versatile CVD process to meet industrial requirements. In this chapter, the requirements to the precursors suitable for DLI-CVD, different classes of available precursors, and models used to describe the evaporation are overviewed. Then, different liquid delivery devices used in DLI-CVD such as capillary tubes, syringes, aerosol delivery systems, and valves are reviewed in detail.
Highlights
In the last decades, thin film technology has been integrated with many large area applications in electronics, information processing/storage, telecommunications, LED lighting/displays, solar energy harvesting, etc
Liquid mass flow controllers appear as a viable option for controlling a rate of a liquid flow, but they cannot be used as a direct liquid delivery unit in Chemical vapor deposition (CVD) systems
DLICVD is widely applied in industry of thin films fabrication ensuring high productivity and demonstrating excellent film uniformity and repeatability with high throughput in the CMOS era for a variety of different films including high-k dielectrics, rare-earth oxides, perovskite oxide and chalcogenide, and noble metals
Summary
Thin film technology has been integrated with many large area applications in electronics, information processing/storage, telecommunications, LED lighting/displays, solar energy harvesting, etc. Offer in most cases a direct link between the composition of the gas phase and that of the coating [5], they may require less tuning and for this reason they are able to provide to the academia and the industry with “real samples” easier and faster than chemical vapor deposition techniques. Pulsed laser deposition (PLD) is broadly used by researchers for fundamental studies of new materials Physical methods, such as PLD, evaporation, and magnetron sputtering, are not compatible for depositions on non-planar surfaces and cannot offer precision control of the film thicknesses as required by some industries. The delivery of reactants depends on three parameters: the temperature of the bubbler, the carrier gas flow rate, and the pressure over the surface of the liquid This system works well with liquid precursors which vapor pressures are not too low and not too high. We overview liquid delivery systems developed to date emphasizing on the problems it solved and the challenges it rose
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