Direct laser patterning of self-assembled monolayer using elliptical laser beams: A theoretical parametric study

Abstract

A theoretical quantitative analysis of processing parameters for application of an elliptical laser beam to achieve maximum patterning area is the focus of this study. Direct laser patterning (DLP) of self-assembled monolayers (SAM) is achieved by localized heating of the sample above the SAM desorption temperature. Through use of elliptical laser beams in the present work, three goals are achieved by analyzing the heat diffusion model and related thermo-kinetics model: (1) optimal working conditions (combination of laser power, scanning velocity and aspect ratio) for DLP to produce maximum feature size, or highest processing velocity at a given power; (2) identification of conditions that reduces the potential thermal damage to the substrate; (3) shedding light on issues related to uniformity or homogeneity of heating a substrate using an elliptical laser beam. A heat diffusion model is employed to provide the resulting surface temperature caused by elliptical laser beams, and the coupled thermo-kinetics model is used to determine the final SAM coverage generated by DLP. Parametric analysis revealed that 70–150 mW can be used to pattern feature sizes in the range of 2–10 times of equivalent circular beam size. It is also found that each elliptical laser beam has a unique optimal aspect ratio to result in the widest feature size for a given laser power and scanning velocity. The edge transition width increases with an increase of the aspect ratio. Keeping the aspect ratio of elliptical laser beam small (i.e. β<20), a sharp edge definition could be obtained; if an aspect ratio larger than 30 is used, a surface with gradual edge definition could be obtained.