Abstract

We report the growth of high-quality GaN layer on single-walled carbon nanotubes (SWCNTs) and graphene hybrid structure (CGH) as intermediate layer between GaN and sapphire substrate by metal-organic chemical vapor deposition (MOCVD) and fabrication of light emitting diodes (LEDs) using them. The SWCNTs on graphene act as nucleation seeds, resulting in the formation of kink bonds along SWCNTs with the basal plane of the substrate. In the x-ray diffraction, Raman and photoluminescence spectra, high crystalline quality of GaN layer grown on CGH/sapphire was observed due to the reduced threading dislocation and efficient relaxation of residual compressive strain caused by lateral overgrowth process. When applied to the LED structure, the current-voltage characteristics and electroluminescence (EL) performance exhibit that blue LEDs fabricated on CGH/sapphire well-operate at high injection currents and uniformly emit over the whole emission area. We expect that CGH can be applied for the epitaxial growth of GaN on various substrates such as Si and MgO, which can be a great advantage in electrical and thermal properties of optical devices fabricated on them.

Highlights

  • Direct growth of G allium nitride (GaN) layer on carbon nanotube-graphene hybrid structure and its application for light emitting diodes

  • We report the growth of high-quality GaN layer on single-walled carbon nanotubes (SWCNTs) and graphene hybrid structure (CGH) as intermediate layer between GaN and sapphire substrate by metal-organic chemical vapor deposition (MOCVD) and fabrication of light emitting diodes (LEDs) using them

  • scanning electron microscope (SEM) image of carbon nanotubes and graphene hybrid structure (CGH) reveals that CNTs with random network are well formed on the CVD-synthesized-graphene film

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Summary

Introduction

Direct growth of GaN layer on carbon nanotube-graphene hybrid structure and its application for light emitting diodes. We report the growth of high-quality GaN layer on single-walled carbon nanotubes (SWCNTs) and graphene hybrid structure (CGH) as intermediate layer between GaN and sapphire substrate by metal-organic chemical vapor deposition (MOCVD) and fabrication of light emitting diodes (LEDs) using them. Direct epitaxial growth of GaN film onto graphene layer on substrates such as sapphire, Si, and MgO is not accessible due to the lack of chemical reactivity on graphene which consisted of C-C bond of sp[2] hexagonally arranged carbon atoms with no dangling bonds[14]. It has been reported that epitaxial growth of GaN film on graphene layers could be achieved by inserting high-density zinc oxide nanowalls as an intermediate layer on plasma-treated graphene[14,15]

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