Abstract

Two different analytical approaches, direct exposure electron ionization mass spectrometry (DE-MS) and gas chromatography/mass spectrometry (GC/MS), were compared in a study of archaeological resinous materials. DE-MS was found to be an efficient fingerprinting tool for the fast screening of organic archaeological samples and for providing information on the major components. GC/MS appeared to be more efficient in unravelling the sample composition at a molecular level, despite the long analysis time and the need for a wet chemical pretreatment. Both procedures were applied to characterize the organic material present as coatings in Roman and Egyptian amphorae. DE-MS successfully identified abietanic compounds, hence a diterpenic resinous material could be identified and its degree of oxidation assessed. GC/MS enabled us to identify dehydroabietic acid, 7-oxodehydroabietic acid, 15-hydroxy-7-oxodehydroabietic acid, 15-hydroxydehydroabietic acid, retene, tetrahydroretene, norabietatriene, norabietatetraene and methyl dehydroabietate. These oxidized and aromatized abietanes provided evidence that the amphorae examined were waterproofed with a pitch produced from resinous wood of plants from the Pinaceae family. The chemometric evaluation of the GC/MS data highlighted significant chemical differences between the pitches found in the two archaeological sites, basically related to differences in the production techniques of the materials and in their degradation pathways.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.