Abstract

The first direct determination of the quadratic electro-optic coefficient, s, of a-Si:H at λ = 1.3 μm from measurements of the electro-optic effect in an a-Si:H based waveguide is reported. From ‘ac’ experiments in which voltage pulses at a frequency of about 500 Hz were used, a direct determination of s yields the value of 2 × 10 −14 (cm/V) 2. Using this result to interpret the electro-optic effect in ‘dc’ experiments, estimates are obtained for the interface charge density at the boundary between a:SiH and a-SiN x :H cladding layers.

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