Abstract
TiO2 (rutile) films have been successfully prepared by the coating photolysis process using ArF excimer laser irradiation at room temperature. The choice of the Ti-alkoxide type as the starting material and the effects of atmosphere on the product films have been studied by Fourier transformation infrared (FT-IR) and X-ray diffraction (XRD). When using Ti(O-i-C3H7)4 as the starting material, rutile films were obtained by the irradiation in a dry N2 atmosphere, whereas amorphous films were obtained by irradiation in air. When using Ti(OCH2CH(C2H5)-n-C4H9)4 as a starting material, rutile films were obtained by the irradiation even in the air atmosphere. Crystallization mechanism is also discussed.
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