Abstract
Precipitation and dissolution of γNb5Si3 precipitates in an Nb-Ti-Si based alloy has been visualized by atomic-scale in-situ heating transmission electron microscopy. Nanoscale γNb5Si3 precipitates nucleate inside Nbss around 850 °C with two orientation relationships (ORs): (200)Nb//11¯00γ (OR-I) and 101¯Nb//11¯00γ (OR-II). Growth and dissolution of the two orientational γNb5Si3 precipitates are promoted by motion of atomic steps and facets at interfaces. Precipitates along OR-I is less stable than that of OR-II, adopting dissolution temperature of 1125 °C and 1250 °C respectively. The orientational stability of γNb5Si3 precipitates, which is correlated with planar disregistry, affects their evolution behavior directly upon heating.
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