Abstract
In this study, a simple and fast electrochemical method was employed to synthesis molybdenum diselenide thin film. Molybdenum diselenide films have been electrodeposited on FTO substrates from an ammoniacal solution of H2MoO4 and SeO2. We fabricated thin films composed of MoSe2, MoO2 and MoO3 elements by adjusting some electrodeposition factors, e.g., deposition time and potential. The Structural characterizations of the electrodeposited films were investigated by SEM, Scanning tunneling spectroscopy (STS), Raman spectroscopy and UV-Visible spectroscopy. And also, Electronic and optical gap have been measured by STS and UV-Vis spectra, respectively.
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