Abstract
We study the properties of reflection-type V-ridge gratings in the subwavelength domain and describe a method to realize diffractive optical elements by using such gratings as signal carriers. In particular, we utilize a coding scheme based on position modulation of a high-frequency V-ridge carrier grating. We design and demonstrate beam splitting elements using this coding scheme, electron-beam lithography, anisotropic wet etching of silicon, hot embossing of polymer, and metal deposition. These elements have the outstanding property of operating over a large spectral range from 406 to 520 nm. The measured diffraction patterns show excellent agreement with theoretical results given by rigorous diffraction theory.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
