Abstract
A diffractive beam homogenizer, based on an array of square, off-axis, continuous-relief diffractive microlenses, for use with an excimer laser has been studied. We originally fabricated the homogenizer by direct-write electron-beam lithography, from which we made replicas in UV-grade fused silica by hot embossing and reactive ion etching. Atomic force microscopy measurements of original and replicated elements showed the accuracy of the replication fidelity. One of the replicated homogenizers was evaluated together with a KrF excimer laser. The homogenized beam had a flat-top profile with 31% of the beam energy contained within an area where the beam intensity was above a threshold level of 90% of the maximum intensity.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
