Abstract
We present a variety of diffractive and refractive x‐ray optics developed for imaging and microfocusing applications at synchrotron beam lines covering almost three orders of magnitude in photon energy from the EUV to hard x‐rays. For EUV radiation, soft x‐rays and the multi‐keV region, we have fabricated and tested Fresnel zone plates providing high resolution and photon efficiency. For photon energies beyond 10 keV transmission zone plates are very rarely used because usually only very low diffraction efficiencies are obtained. We have manufactured blazed linear Fresnel zone plates with efficiencies of more than 60% in the 10 to 15 keV range. Besides focusing elements, we also present other diffractive optics such as beam splitters for interferometric or lithographic applications. For hard x‐rays, we have developed planar refractive lenses from silicon and diamond. The silicon devices cover an energy range from 35 to 50 keV. The diamond refractive lenses are optimized for 10 to 20 keV photon energy, material and the optical design are optimized for high radiation loads making them promising candidates to be used in future X‐FEL sources.
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