Abstract
We propose a method for designing a long-focal-depth diffractive achromat (LFDA). By applying rotational symmetric parameterization, an LFDA with a diameter of 10.89 mm is designed over three wavelengths at six focal planes. The smoothly changed slope designed by the binary variable slope search (BVSS) algorithm greatly reduces the discontinuity in depth, thus it is a fabrication-friendly process for grayscale laser direct writing lithography, involving less fabrication error and cost. The deviation between the designed and fabricated profiles amounts to 9.68%. The LFDA operates at multiple wavelengths (654 nm, 545 nm, and 467 nm) with a DOF of 500 mm~7.65λ × 105 (λ = 654 nm). The simulated and measured full-width at half-maximum (FWHM) of the focused beam is close to the diffraction limit. Experimental studies suggest that the LFDA possesses a superior capability to form high-quality chromatic images in a wide range of depths of field. The LFDA opens a new avenue to achieve compact achromatic systems for imaging, sensing, and 3D display.
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