Diffraction efficiency growth of nano-scale holographic recording produced in a corona discharge

Abstract

The nano-scale holographic gratings ware recorded in 29 nm and 56 nm thick As2S3 films. The chalcogenide layers were deposited on a transparent chromium electrode with thickness 10 nm, produced on a glass substrate. Both chromium and chalcogenide films were deposited in one vacuum cycle by e-beam and thermal evaporation, respectively. The diode 532 nm diode laser was used as a light source in the present holographic experiments. The total internal reflection arrangement (Stetson-Nassenstein) was used in holographic recordings. The reference beam was totally reflected from the air-As2S3 boundary surface by an input glass prism. The object beam was normally incident on the recording medium. The corona charging was performed by a needle fixed at the distance of 1 cm from the holographic recording medium by applying a – 5 kV voltage. The diffraction efficiency increased from 9 to 30 times when the corona discharge was applied during the holographic recording, in comparison to the uncharged recording. The possible reason of the observed effect is discussed on the basis of the Franz-Keldysh effect and Moss rule.