Abstract
Two microscopes with focused ion beam (FIB) columns in the Department of Materials, Imperial College, have been fitted with SIMS probes (Hiden EQS 1000). Both probes have differential pumping to maintain the vacuum in the probe below 5 × 10−6 mbar irrespective of the main operating and imaging conditions of the microscopes. In both microscopes, standard operations include the injection of oxygen‐containing species close to the sputter site. This process is also a technique for SIMS analysis instrumentation to enhance positive ion yields during sputtering where an oxygen primary ion beam for dynamic SIMS analysis is not available. The aim of this paper is to describe the compatibility of the differentially pumped SIMS probe with the normal specifications of microscopes. In particular, the modern field emission gun‐SEM instrument's (Zeiss Auriga) ability to provide ultra‐high spatial resolution SIMS in combination with electron microscopy imaging, energy dispersive spectroscopy and electron backscatter diffraction. In the second instrument, an ion microscope (FEI FIB200), the installed system is additional to the existing FEI SIMS probe. Simultaneous detection of positive and negative secondary ions from the same sputtered crater is obtained on this instrument with the two SIMS probes. Copyright © 2014 John Wiley & Sons, Ltd.
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