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Abstract
Differential scanning calorimetry analysis has been used to characterize a number of novolak resins, photoactive compounds and novolak-based photoresists. In the course of our investigation, insight was gained into the water retention mechanisms involved in novolak-based compounds, i.e., water molecules leave the polymer network in a two-step drying process: one below and another above glass transition temperature. A preliminary physical treatment of the samples to be analyzed is proposed and ensures simultaneous measurement of the glass transition temperature signal and the exothermic peak from the photoactive compound. The thermal signatures of various commercial photoresists have been obtained using this technique.
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