Different biological effects of exposure to far-UVC (222nm) and near-UVC (254nm) irradiation.

Abstract

Ultraviolet C (UVC) light has long been used as a sterilizing agent, primarily through devices that emit at 254nm. Depending on the dose and duration of exposure, UV 254nm can cause erythema and photokeratitis and potentially cause skin cancer since it directly modifies nitrogenated nucleic acid bases. Filtered KrCl excimer lamps (emitting mainly at 222nm) have emerged as safer germicidal tools and have even been proposed as devices to sterilize surgical wounds. All the studies that showed the safety of 222nm analyzed cell number and viability, erythema generation, epidermal thickening, the formation of genetic lesions such as cyclobutane pyrimidine dimers (CPDs) and pyrimidine-(6-4)-pyrimidone photoproducts (6-4PPs) and cancer-inducing potential. Although nucleic acids can absorb and be modified by both UV 254nm and UV 222nm equally, compared to UV 254nm, UV 222nm is more intensely absorbed by proteins (especially aromatic side chains), causing photooxidation and cross-linking. Here, in addition to analyzing DNA lesion formation, for the first time, we evaluated changes in the proteome and cellular pathways, reactive oxygen species formation, and metalloproteinase (MMP) levels and activity in full-thickness in vitro reconstructed human skin (RHS) exposed to UV 222nm. We also performed the longest (40days) in vivo study of UV 222nm exposure in the HRS/J mouse model at the occupational threshold limit value (TLV) for indirect exposure (25mJ/cm2) and evaluated overall skin morphology, cellular pathological alterations, CPD and 6-4PP formation and MMP-9 activity. Our study showed that processes related to reactive oxygen species and inflammatory responses were more altered by UV 254nm than by UV 222nm. Our chronic in vivo exposure assay using the TLV confirmed that UV 222nm causes minor damage to the skin. However, alterations in pathways related to skin regeneration raise concerns about direct exposure to UV 222nm.