Difference between the cell wall roughnesses of mothers and daughters of Saccharomyces cerevisiae subjected to high pressure stress

Abstract

High hydrostatic pressure (HHP) stress generates cellular responses similar to those to other stresses that yeasts endure in fermentation tanks. Structural and spatial compaction of molecules, as well as weakening and stretching of plasma membranes and cell walls, are often observed and have a significant influence on the fermentative process. Atomic force microscopy (AFM) yields accurate data on the morphological characteristics of yeast cell walls, providing important insights for the development of more productive yeast strains. Saccharomyces cerevisiae cell wall assessment using AFM in the intermittent contact reading mode using a silicon cantilever, before and after application of a pressure of 100 MPa for 30 min, demonstrated that mother and daughter cells have different responses. Daughter cells were more sensitive to the effects of HHP, presenting lower average Ra (arithmetic roughness), Rz (ten-point average roughness), and Rq (root-mean-square roughness) after exposure to high pressure. Better adaptation to stress in mother cells leads to higher cell wall resistance and, therefore, to better protection.