Abstract
Here, we reported a study on the detection and electrical characterization of both cancer cell line and primary tumor cells. Dielectrophoresis (DEP) and electrical impedance spectroscopy (EIS) were jointly employed to enable the rapid and label-free differentiation of various cancer cells from normal ones. The primary tumor cells that were collected from two colorectal cancer patients, cancer cell lines (SW-403, Jurkat, and THP-1), and healthy peripheral blood mononuclear cells (PBMCs) were trapped first at the level of interdigitated microelectrodes with the help of dielectrophoresis. Correlation of the cells dielectric characteristics that was obtained via electrical impedance spectroscopy (EIS) allowed evident differentiation of the various types of cell. The differentiations were assigned to a “dielectric phenotype” based on their crossover frequencies. Finally, Randles equivalent circuit model was employed for highlighting the differences with regard to a series group of charge transport resistance and constant phase element for cancerous and normal cells.
Highlights
Fabrication of Interdigitated MicroelectrodesThe interdigitated microelectrodes were manufactured within a clean room facility class 1000 (ISO 5)
Introduction published maps and institutional affilLabel-free manipulation, sorting, and isolation of biological cells and, in particular, cancerous cells, are a matter of concern at a worldwide level
Differences noticed at frequencies below 10 kHz between normal cells (PBMC and THP-1) and cancer cells (Jurkat, SW-403, T1, and T2) may be attributed to the surface morphological features of the cell membranes and to the electrode surface area which is covered with cells
Summary
The interdigitated microelectrodes were manufactured within a clean room facility class 1000 (ISO 5). UV exposure, the photoresist was developed in a specific solution (HPRD 402) for 30 s In this step, the two photoresists were patterned with the layout of the conductive electrodes where the UV exposure was performed. The lift-off process was completed in acetone to allow the photoresist to dissolve while leaving behind the metal pattern. This process was used for electrode gold patterning on the surface of Si wafer. The SU-8 resist was exposed using a photolithographic mask using the MA6 mask aligner for 8 s, followed by post-baking on a hot plate at 65 ◦ C for 1 min and at 95 ◦ C for 6 min, and developed in mr-DEV-600 solution for 2 min. Each interdigitated microelectrode array had 16 fingers with a length of 2560 μm, the gap between the fingers and the intercastellations had a dimension of 40 μm
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