Abstract
Dielectric thin films have a wide range of applications. Large band gap of dielectric materials have made them more relevant to use as an insulating layer and also as gate materials in microelectronic industry. Some dielectrics are ferroelectric in nature below Curie temperature. The charge retention properties of ferroelectrics have made them very important material for nonvolatile FRAM type of memory applications. Perovskite group of dielectrics are very useful for various sensor applications. Recent advancement of thin film preparation techniques have enabled perovskite dielectric films to be applicable in wide range of devices like optical coatings, photovoltaics, electrocaloric etc. Through this article we have discussed different fabrication techniques of dielectric films and the latest applicability of them.
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