Abstract
Functional graphene oxide (FGO) with photosensitivity was incorporated into the photosensitive polyimide (PSPI) matrix via solution blending, to prepare the photocrosslinkable nano-composite films. The crosslinked composite films were obtained through UV irradiation. FGO was well dispersed in PSPI matrix and effectively covalently bonded to PSPI main chains through photo-chemical reaction. Due to the confine of electronic polarization caused by the crosslinked structure, the dielectric constant (k) and dielectric loss tangent (tanδ) of the crosslinked PSPI/FGO films decreased effectively, which could be tuned by varying both the UV irradiation time and FGO loading. Among all the composite films, the film with 0.5wt% FGO content exposed under UV light for 900s had the lowest k (2.58) and tanδ (0.026) values at 10MHz. These findings suggest that PSPI/FGO composite films are promising application in the field of photoresist with low dielectric constant.
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