Abstract
The aim of this paper is to present the manufacturing of thin GaAs and dielectric membranes as support for microwave and millimeter wave circuit elements. The dielectric membranes are realised by anisotropic etching techniques of the <100< silicon substrate. GaAs membranes are obtained by nonselective etching techniques. The paper also presents the manufacturing of interdigitated capacitors, and a band stop filter supported on a thin SiO/sub 2//Si/sub 3/N/sub 4//SiO/sub 2/ membrane.
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