Abstract
A 1: 1 donor–acceptor complex between SiCl2 and HCl was detected by matrix IR spectroscopy. The existence of the complex was previously predicted theoretically in the course of analysis of mechanisms of chemical vapor deposition (CVD) processes involving chlorosilanes. The quantum chemical calculations at the G4(MP2) level confirmed the possibility of formation of only one stable complex upon the reaction of SiCl2 with HCl. In addition to the complex of the simplest composition, complexes of SiCl2 with HCl associates were observed upon matrix annealing. The only product formed upon the photolysis of the complexes of all types was trichlorosilane, a product of silylene insertion into the H–Cl bond.
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