Abstract

Summary form only given. Holographic lithography is a general and flexible technique for the fabrication of three-dimensional photonic crystals. Three-dimensional microstructure is generated when a four-beam laser interference pattern is used to expose a thick layer of photoresist. Highly exposed regions in the resulting three-dimensional intensity grating are rendered insoluble; unexposed areas are then dissolved away to produce a three-dimensional photonic crystal formed of cross-linked polymer with air-filled voids. The polymeric structure may be used as a template for the production of photonic crystals with higher refractive index contrast. This technique is particularly well adapted to the production of structures with the sub-micron periodicity required for applications in the visible optical spectrum.

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