Abstract
An rf plasma deposition system was used to prepare amorphous ‘‘diamondlike’’ carbon films. The source gases for the rf system include methane, ethylene, propane, and propylene, and the parameters varied were power, dc substrate bias, and postdeposition anneal temperature. Films were deposited on various substrates. The main diagnostics were optical absorption in the visible and in the infrared, admittance as a function of frequency, hardness, and Auger and ESCA spectroscopy. Band gap is found to depend strongly on rf power level and band gaps up to 2.7 eV and hardness up to 7 Mohs were found. There appears to be an inverse relationship between hardness and optical band gap.
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More From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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