Abstract
Deposition technology has played a major part in the creation of today’s scientific devices. Computers, electronic equipment, biomedical implants, cutting tools, optical components, and automotive parts are all based on material structures created by thin film deposition processes. There are many coating processes ranging from the traditional electroplating to the more advanced laser or ion-assisted deposition. However, the choice of deposition technology depends upon many factors including substrates properties, component dimensions and geometry, production requirements, and the exact coating specification needed for the application of interest. For complex geometry components, small feature sizes, good reproducibility, and high product throughput, chemical vapor deposition (CVD) is a highly effective technology. For example, low pressure and plasma-assisted CVD is a well-established technology for semiconductor devices, which has very small feature sizes and complex geometrical arrangements on the surface.
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