Year-end Sale % OFF 
Abstract
Abstract For the fabrication of microdevices with line widths approching 1 μm, a patterning methodology has been developed by the modification of an existing plasma etching process, which is suitable for any form and type of diamond. These microdevices have been tested as active sensing elements for both environmental control and metrological applications: voltammetric detection of chlorine, detection of atomic oxygen for space and terrestrial applications, the measurement of ultraviolet (UV) light, and finally, conductive atomic force microscopy (AFM), which is successfully performed today with microfabricated diamond tips.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
