Abstract
Diamond-like nanostructured carbon films were deposited by a new type of vacuum arc technique, named thermionic vacuum arc (TVA) in a high-vacuum (10 −6 mbar) chamber. This is our first report in an international journal on TVA use for nanostructured carbon film deposition. TVA technology has two main advantages: (1) the continuous bombardment of just depositing thin film by energetic carbon ions generated in carbon vapors plasma and (2) the ions energy can be fully controlled and changed at will even during deposition. The structures of the films have been characterized by high-resolution transmission electron microscopy, selected area electrons diffraction and fast Fourier transmission. The measured interatomic distances reveal a diamond-like nanostructure carbon film with an average grain size approximately 3–5 Å and a d-spacing of 0.286 nm, which corresponding to a rhomboedral lattice of diamond/carbon (ASTM 0015—pattern no 79-1473). The results demonstrate that the TVA is suitable for the preparation of diamond-like nanostructured coatings with high quality.
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