Abstract
Deposition of diamond films was performed in a sub-atmospheric thermal RF induction plasma reactor. The pressure varied from 600 to 200 mbar (60 to 20 k Pa) and the axial distance of the substrate from the plasma centre varied from 6 to 15 cm. The deposits varied from individual diamond crystallites to very smooth and homogeneous diamond films. The grain size varied from about 10 μm to between 0.01 and 0.1 μm in the finest case depending on deposition conditions. The deposition rate of the films varied between 4 and 11 μm/h.
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