Abstract
Results of experiments with the deposition of polycrystalline diamond films onto silicon, titanium, and molybdenum substrates in a specially designed ac glow discharge system are presented. The phase composition and morphology of deposited films have been studied using the atomic force microscopy and X-ray diffraction techniques. It is established that the obtained diamond films possess high purity and degree of crystallinity. Inclusions of non-diamond carbon phases are absent. The rate of diamond film growth in the proposed system is 6–7 μm/h.
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