Abstract
The paper studies non-thermal dielectric barrier discharges (DBD) operated in a parallel plate reactor (6 cm width and 16 cm long) under atmospheric pressure in Ar/HMDSO and Ar/HMDSO/O2 mixtures at different O2 to HMDSO ratio and different power. Emission spectroscopy and FT-IR absorption spectroscopy were applied to get information on the reaction products in the DBD. The spectroscopic analysis was performed at three residence time. The properties of the polymer films deposited on silicon wafer were measured by FT-IR absorption spectroscopy, AFM and XPS analysis. Surface tension was obtained from contact angle measurements with water and CJ2H2. The correlation between properties of plasma and the results of thin film diagnostics has been investigated.
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