Diagnostics of microdischarge-integrated plasma sources for display and materials processing

Abstract

Two different types of microdischarge-integrated plasma sources have been operated at around the atmospheric pressure range. The discharge characteristics were diagnosed by optical emission spectroscopy (OES), laser absorption spectroscopy (LAS) and microwave transmission (MT) techniques. The dynamic spatiotemporal behaviour of excited atoms was analysed using OES and LAS and the temporal behaviour of the electron density was estimated using the MT method. In Ar and Xe/Ne gases, waveforms of the MT signal followed the current waveform in the rise period and lasted longer according to the recombination losses. However, in He the waveform followed the density of metastable atoms, reflecting the production of a large amount of electrons by the Penning ionization process with impurities. The estimated peak electron density in those plasma sources is of the order of 1012 cm−3, and the metastable atom density can reach 1013 cm−3. Thus, it is suggested that these sources can be potentially applied to convenient material processing tools of large area operated stably at atmospheric pressure.