Diagnostics of high density plasma reactors used in the processing of electronic and photonic materials (invited) (abstract)

Abstract

High-density plasmas are being used in the manufacture of electronic devices and systems because they provide high throughput at low pressure and low ion energy. Low pressure is desirable for maximizing process uniformity over large substrates while low ion energy is desirable for minimizing process-induced damage. However, the optimal design for a high density plasma reactor is unclear and the technology has largely developed empirically: many alternatives for magnetic and geometric design are offered for the same processing applications. In this talk we discuss diagnostic measurements of high density plasma reactors and how they can be used in developing improved reactor designs and in providing insight into materials processing. Laser-induced fluorescence measurements of metastable ion velocity distributions are made in both Ar and Cl2 electron cyclotron resonance and helicon plasmas. The effects of magnetic field configuration, power, and pressure on the energy and angular distributions of the ions will be described along with electron density measurements made by microwave interferometry. Where appropriate, comparisons will be made with the recent theoretical results of Graves and Porteous [D. B. Graves and R. K. Porteous, American Vacuum Society National Symposium, Seattle, WA, November (1991)].