Abstract
The effects of block copolymer adhesion promoters on the dewetting of polystyrene, PS, homopolymer films with degree of polymerization, P, ∼300 are investigated using optical microscopy and atomic force microscopy. The copolymers are poly(deuterated styrene-block-methyl methacrylate), dPS-b-PMMA, having a short anchoring block that is attracted to the substrate and a long nonadsorbing block with a varying degree of polymerization, NNA. Relative to a homopolymer film on silicon oxide, SiOx, hole growth slows down, and holes stop growing at a diameter of about 100 μm when 1 vol % block copolymer having NNA P. Moreover, as the substrate is changed from SiOx to a more hydrophobic and less wettable amino-terminated surface, we observe an improvement in thin film s...
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