Abstract

Owing to its ability to produce an assembly of nanoislands with controllable size and locations, the solid state dewetting of patterned films has recently received great attention. A simple Kinetic Monte Carlo model based on two reduced energetic parameters allows one to reproduce experimental observations of the dewetting morphological evolution of patterned films of Si(001) on SiO2 (or SOI for Silicon-on-Insulator) with various pattern designs. Thus, it is now possible to use KMC to drive further experiments and to optimize the pattern shapes to reach a desired dewetted structure. Comparisons between KMC simulations and dewetting experiments, at least for wire-shaped patterns, show that the prevailing dewetting mechanism depends on the wire width.

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