Development of x-ray photoelectron microscope with an x-ray laser source

Abstract

We have constructed an x-ray photoelectron microscopic system with an x-ray laser as an x-ray source. The lasing line is the Li-like Al 3d-4f transition at 15.47 nm where the recombining Al plasma is used as the x-ray laser medium. The beam from the x-ray laser cavity was then focused by using a Schwarzschild mirror coated with Mo/Si multilayers. The x-ray beam size with a diameter less than 0.5 μm and the estimated photon number of about 2×106 photons/shot into the spot were achieved.