Abstract
The structures of Pt/AlN multilayer films were characterised by a combination of X-ray reflectivity (XRR) and X-ray diffraction (XRD). As-deposited film has accurate periodicity and abrupt interfaces, which make possible specular reflections up to 2q = 15°. The reflectivities of 1st Bragg reflection of the specimens annealed at temperatures below 600°C are almost constant about 65%. By annealing, intensity modulations overlap on the 111Pt reflection, indicating the formation of a kind of superlattice in the multilayer films. Annealing is considered to cause the release of sputtering gases, recovery and small orientation adjustment of Pt layers. On the other hand, AlN layers do not show changes during annealing at these temperatures. As a result, adjacent Pt layers with preferred orientation come to show a correlation in diffraction intensity although they are separated by AlN.
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