Abstract
A rotational maze-shaped RF magnetron sputtering plasma has been developed by combining three kinds of rod magnets for improving target utilization. The maze-shaped plasma is produced to perform the closed form along the magnetron motion predicted by the magnet arrangement. The radial profile of a copper target erosion has two peaks and the pattern is based on rotating the maze-shaped plasma. A target utilization rate has attained approximately 64.8%, which is to two to three times higher than that of conventional stable magnetron sputtering. Al-doped ZnO deposited thin films have shown resistivity of 1.5–2.6 × 10−4 Ω cm under a substrate at room temperature and the transmittance gets to approximately 90% in the visible region. It is found from X-ray diffraction pattern that the diffraction peak of AZO films is 33.97° and the grains exhibit a preferential orientation along the (002) axis.
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