Abstract
For high-resolution positioning of a precision stage, conventional positioning systems require laser interferometers or capacitance displacement sensors to measure nanoscale displacements. These can be expensive and complicated. In this study, a new measuring system was developed using multi laser reflection and mechanical magnification of its displacement. The displacement of the stage was measured using a position-sensitive photodiode (PSPD), a laser diode (LD), a hinge-connected rotating mirror plate, and two reflection mirror plates. A beam from the laser diode was focused on the center of the rotating mirror. The beam was reflected onto one of the reflection mirrors, and underwent several reflections. The position variation of the reflected beam from the reflection mirrors was then measured by the PSPD. Using this magnified displacement system a measuring resolution of less than 5 nm was achieved.
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