Development of Nb/Al–AlOx/Nb Tunnel Junction for Large-Scale Integrated Digital Circuits

Abstract

We present the latest development of an Nb/Al-AlO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> /Nb Josephson junction fabrication process for superconducting integrated circuits at SIMIT. Our fabrication process has four niobium superconducting layers and one Ti/Pd resistor layer with 1.0 Ω/square sheet resistor for junction shunting and circuit biasing. Critical current density J <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">c</sub> of the junctions is controlled from 30 A/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> to 10 kA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> by exposing aluminum layer to pure or mixed O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> atmosphere. Correlation between measured J <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">c</sub> and exposure conditions has been established. Average quality factor (R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">sg</sub> /R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">n</sub> ) of the junctions in our process is larger than 20 with subgap leakage factor (V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</sub> ) beyond 30 mV. Critical current uniformity is obtained according to the switching current (I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> ) distribution of a 1000-JJ array. Measured standard deviation sigma of I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> is less than 4% over the 100-mm wafer. Plasma resonance in a large Josephson junction is used to measure specific capacitance (C <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> ) of the junction. Sheet inductances of superconducting niobium strip-lines are extracted by a SQUID diagnose circuit and the measured results show good agreement with our design values.