Abstract
We have developed the mustrip gas chamber (MSGC) by using multi-chip technology which supports high-density assembly of bare LSI chips on a silicon wafer. Our MSGC was operated steadily with ∼ 103 gain more than one week. An energy resolution of 15% for 5.9 keV X-ray of a 55Fe source was obtained. With a very thin polyimide substrate of 16 μm thickness, two interesting phenomena were observed; one was a strong dependence of gains on backplane potential, and the other was little time variation of gains. We also found that a guard mask of a thin polyimide layer on the cathode edge reduced incidental electrical discharges between anode and cathode strips.
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