Abstract
In this paper, diamond film-coated silicon was developed to be used as a substrate in a microstrip gas chamber (MSGC) for the first time. The roughness of the composite substrate was rather low, and the resistivity was in the range of 1010–1011Ω cm. Its capacitance was very small and almost had no variation with frequency. All these results prove that the diamond film/Si composite material is a promising substrate for MSGCs. Using this composite substrate, a MSGC detector with an area of 2 × 2 cm2 was fabricated. The effects of the drift voltage and cathode voltage on the energy resolution for 5.9 keV 55Fe x-rays have been examined in detail and discussed. An energy resolution (the relative full width at half maximum of the x-ray peak) of 12.3% was achieved when the MSGC was operated at a drift voltage of −1000 V and a cathode voltage of −650 V with a gas mixture (90% Ar + 10% CH4).
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.