Abstract
We report on the fabrication and characterization of an ultraviolet (UV) light-emitting diode (LED) based on a p-n junction MgZnO/ZnO/AlGaN/GaN semiconductor triple-heterostructure (THS). Radio-frequency (RF) plasma-assisted molecular-beam epitaxy (MBE) has been employed to grow individual epitaxial layers of ZnO, MgxZn1−xO, and the complete heterostructure on c-plane GaN/sapphire templates. Various growth strategies have been used to optimize the quality of the ZnO layers as well as to precisely control the composition of the MgxZn1−xO compound. Cross-sectional transmission electron microscopy (TEM) study shows the excellent crystalline quality of the pseudomorphically grown ZnO active region of the device. A strong electroluminescence (EL) emission associated with ZnO excitonic transition was observed up to 650 K. The results shown in this paper strongly suggest the viability of RF plasma-assisted MBE in the development of next-generation UV emitters using ZnO-based materials.
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