Abstract
The application of electrothermal and magnetron sputtering methods for manufacturing thin films containing palladium and silver is investigated. In the process of electrothermal sputtering, indirect heating of the evaporated material was used in a tungsten and tantalum boat, through which a current has been conducted and a direct heating of a thin plate of palladium alloy has been entailed by current. A composite target for magnetron sputtering of alloys using silver and palladium plates with different ratios of their areas has been developed. The dependence of the film composition on the target composition is determined. As a result of sputtering for 40 min, a sample with a thickness of 1.1 microns and a silver content of 23.2±0.7% was obtained from a target with an area ratio S(Ag)/S(Pd) = 20.8/79.2.
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