Abstract

Nanocrystalline CdS thin films have been prepared by the sol-gel spin-coating method. The influence of spin-coating process parameters such as, thiourea concentration (U), annealing temperature (A), rotational speed (S), and annealing time (T), and so on, on the properties of the prepared films have been studied. The experiments have been carried out based on four factor-five-level central composite designs with the full replication technique, and mathematical models have been developed using regression technique. The central composite rotatable design has been used to minimize the number of experimental parameters. The analysis of variance technique is applied to check the validity of the developed models. The developed mathematical model can be used effectively to predict the particle size in CdS nanocrystalline thin films at 95 pct confidence level. The results have been verified by depositing the films using the same condition. An ultraviolet-visible optical spectroscopy study was carried out to determine the band gap of the CdS nanocrystalline thin films. The band gap has been observed to depend strongly on particle size, and it indicated a blue shift caused by quantum confinement effects. The high-resolution transmission electron microscopy analysis showed the grain size of the prepared CdS film to be 6 nm. The main and interaction effects of deposition parameters on the properties of CdS nanocrystalline thin films also have been studied.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.