Abstract
In 1986, we developed a mass-production-type plasma chemical vapour deposition (CVD) equipment which is at present being used in its application to various dies. The effective dimensions of workpieces treated with this equipment are 460 mm in diameter and 800 mm in height. The equipment is of external-heating construction and can rotate a workpiece which is being processed by fully automatic operation with a computer. A film consisting of a titanium compound produced at a low temperature of about 773 K with this equipment has the characteristics of good adhesion, throwing power and denseness. Therefore, by using the PCVD process with this equipment, a longer life of the die is attained in comparison with the use of the chemical vapour deposition and physical vapour deposition processes with various dies, such as cold-working dies, hot-working dies and plastic moulds.
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