Abstract
We report on a local ambient gas control technologies for atmospheric pressure plasma process using our new curtain gas structure. First, local ambient gas control with the curtain gas structure was investigated by computational fluid dynamic code. After confirmation of the feasible cleanness level with this structure, which is comparable to impurity level in semiconductor grade material gas (below 1 ppm), we fabricated a prototype apparatus. Measuring gas distribution by a gas analyzer, local ambient gas control was confirmed experimentally. Next, we attempted H 2 /He plasma generation in open air with H 2 concentration even above explosive limit in air (4.1 %) and achieved stable glow discharge with H 2 concentration of 0–40 %. In addition, reduction of copper oxides was demonstrated by H2 plasma exposure. These results show high potential of our method for atmospheric MEMS processes.
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