Development of ion imprinted based magnetic nanoparticles for selective removal of arsenic (III) and arsenic (V) from wastewater

Abstract

ABSTRACT In this study, we fabricated magnetic ion-imprinted polymers (IIP) for arsenic removal. Ion-imprinted method was developed by complexing N-methacryloyl-l-cysteine (MAC) monomer and As(III) and As(V) as template molecules. The utilization of the MAC-As complex was chosen to provide a rebinding of As(III) and As(V) on IIP. The template molecules were removed by using 0.01 M HNO3 containing 0.05% thiourea solution as a desorption agent. The adsorption of As(III) and As(V) was ideal in buffer solution pH 5.0 for 120 min with removal capacity. The ion-imprinted-based magnetic nanoparticles were selective for arsenic toward other analogs (NO3 −, PO4 3-, SO4 2- as an anion, and AsO2 −, HAsO4 − as an oxi-anion). The adsorption isotherm model fitted the Langmuir model with an R2 value of 0.9935–0.9118 and the Qmax values of 91.7 mg/g for As(III)-IIP magnetic nanoparticles and 99.0 mg/g As(V)-IIP nanoparticles, respectively. Finally, IIP-based magnetic nanoparticle adsorbents have been utilized successfully for effective arsenic removal from wastewater samples.